Used DNS / DAINIPPON SCW-622-B #9111281 for sale

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DNS / DAINIPPON SCW-622-B
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ID: 9111281
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DNS / DAINIPPON SCW-622-B is a photoresist systems for mask alignment lithography applications in electronics semiconductor processing. The equipment includes a computer-controlled wafer stage, a digital imaging system, and an alignment stage for pre-alignment and fine-tuning of the mask. The stage is designed with two-axis tilting and rotational capabilities to handle wafers up to 200 mm in diameter and 30 mm in height. It also includes a precision linear stage for accurate positioning of the mask assembly over the wafer. The digital imaging unit includes an auto-aligner and a video-camera for visual inspection of the alignment between mask and wafer. The machine also includes a software-controlled overlay tool that enables precise image-based alignment. The asset is equipped with a high-resolution motorized projection optical head and a manual projection optics model. The projection optics enable mask images to be projected directly onto the wafer preserving the contact mask pattern size and shape. The alignment unit features a laser positioner with a micron resolution optical laser for pre-alignment and a sub-micron laser sensor for fine-tuning of the mask registration. The equipment is configured for robotic loading via shutter opening/closing of the mask cavity and wafer. The system is capable of operating at low temperatures and includes a built-in vacuum unit for handling of wafers downstream of the project optics. DNS SCW-622-B photoresist machine is ideally suited for applications in semiconductor IC manufacturing including fine-line patterning and driver circuits. The tool is also applicable for LCD flat panel panel display production. Furthermore, the asset is capable of handling a wide range of resists and exposure temperatures. This allows for applications such as thick and thin film patterning, bump-stenciling, and other complex layout patterns requiring extreme precision and accuracy.
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