Used DNS / DAINIPPON SD-80BW-AP #9186681 for sale

DNS / DAINIPPON SD-80BW-AP is a photoresist imaging equipment developed by DNS Screen for semiconductor fabrication. This system is designed to meet the demands of the most advanced lithography requirements in the industry. The unit incorporates advanced technologies such as double-sided mask writing, non-contact development, and a host of other features designed to provide the highest level of exposure accuracy and throughput. The double-sided mask writing capability of the machine allows for simultaneous exposure and writing of both sides of a wafer simultaneously. This allows for shorter exposure times and greater repeatability of results. The double-sided mask writing tool also provides two different writing modes depending on the layers being exposed. The automatic non-contact development feature allows for reduced operator intervention during mask development. The auto-development mechanism automatically sets the most appropriate developer level for each layer and automatically adjusts the developer levels if necessary. This ensures that the developer settings are optimized to get the best resolution for each layer. DNS SD-80BW-AP also features an advanced Control Panel User Interface (CPUI) which simplifies the setting of machine parameters and allows users to quickly check exposure results. The panel is also designed for easy monitoring of the entire asset's operational status, making it easier to make adjustments if any errors occur. The model also features advanced imaging performance by utilizing a multi-level phase-shift quartered interferometer for precision alignment control and a multi-beam profile monitor for high-resolution imaging. DAINIPPON SD-80BW-AP comes with an automated wafer accountability equipment which allows convenient tracking of processed wafers. Lastly, the system has a built-in anti-corrosive unit to minimize the effects of photoresist on the mirror and optical equipment for longer life and better performance. Overall, SD-80BW-AP photoresist imaging machine offers advanced performance and precision control for the highest levels of accuracy and throughput. The tool is designed for highly reliable throughput with an intuitive control panel, and automated wafer accountability for easy tracking of processed wafers.