Used EDWARDS XE-200 #9070677 for sale

EDWARDS XE-200 is a photoresist equipment designed for production of high precision patterns and features on surfaces. The system uses light to selectively alter exposed surfaces. An exposed surface is one that has been coated with a photoresist. Photoresist systems are used for a variety of applications, but XE-200 is particularly well-suited for accurate line patterns that require close tolerance control. EDWARDS XE-200 is composed of advanced optics, including a high-resolution microscope and scanning lens unit, as well as a linear array of LEDs for illumination. The microscope has a magnification range of 20x to 60x, while the scanning lens has a field of view of 1.2 millimeters. The total depth of field achievable with both lenses combined is 0.2 millimeters. The LED array provides uniform coverage of the field of view and offers four preprogrammed exposure ranges. In addition to the optics, XE-200 features advanced software control. The integrated user interface makes it easy to configure and adjust exposure parameters. Furthermore, it enables precise position control of the X-Y stage, allowing the user to move the platform quickly and accurately. The software also allows for customizable profiles of the exposure pattern, which allows the machine to reproduce the same pattern with just a few mouse clicks. Finally, EDWARDS XE-200 employs advanced masking techniques to precisely control the shape and size of the exposed surface. This is achieved by using specialized masks that suppress certain areas of the photoresist and expose others. The tool also features multiple sizes of masks, allowing it to create more intricate patterns. This masking technique is especially beneficial when attempting to create features with very close tolerances. Overall, XE-200 is a high-performance photoresist asset designed to produce intricate, high-precision patterns on surfaces. With its advanced optics, software, and masking techniques, the model is capable of creating line patterns of unprecedented resolution and accuracy. Whether for industrial or scientific applications, EDWARDS XE-200 offers the best possible precision in photoresist production.