Used FSI / TEL / TOKYO ELECTRON K131 #9244159 for sale

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FSI / TEL / TOKYO ELECTRON K131
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ID: 9244159
Wafer Size: 4"
Spin Rinse Dryer (SRD), 4" Maximum: 1000 rpm.
FSI / TEL / TOKYO ELECTRON K131 Photoresist Equipment is a compact, easy-to-use semiconductor sample processing system created by FSI International, Inc. and TEL Limited (TOKYO ELECTRON). The unit is designed to provide professional-level wet etching capabilities to the thousands of small-scale MEMS, GaAs, and semiconductor manufacturers in the semiconductor industry. This machine includes an integrated conveyor-style dispenser for applying photoresist solutions onto wafers, integrated precision motion control for etching to exact depths, and integrated cleaning capabilities for removing photoresist residues. It also provides outstanding throughput and excellent uniformity, an important feature for semiconductor manufacturing. FSI K131 Photoresist Tool uses industry-standard PCB processing techniques like spin coating, photolithography, photoresist stripping, and dip-coating in order to produce desired etching results on wafers. It uses a conventional cartridge-based delivery asset to dispense predetermined amounts of photoresist solutions to the wafer. With spin coating, the photoresist can be applied at precise settings to achieve maximum uniformity. Photolithography is then used to pattern the photoresist on the wafer, allowing it to be etched into the desired design. Using an integrated precision motion control model, TEL K131 Photoresist Equipment is able to achieve precise depths of etch on the wafer. This advanced etch control technology ensures the highest level of accuracy, reliability, and repeatability when etching intricate features. The system also incorporates advanced cleaning capabilities featuring high and low pressure sprayers, ensuring that all residues from the photoresist are removed. TOKYO ELECTRON K131 Photoresist Unit delivers high performance and excellent yields in a compact, low-cost package. Its intuitive operation and easy-to-use interface make it ideal for small- to medium-scale semiconductor manufacturers who require professional-level wet-etching capabilities at an affordable price. The machine offers outstanding throughput, yielding up to three wafers per minute, with repeatable, uniform results. K131 Photoresist Tool is an essential tool for any small scale semiconductor manufacturer looking to improve the quality and productivity of their samples process.
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