Used FSI / TEL / TOKYO ELECTRON Mercury MP #9243803 for sale

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FSI / TEL / TOKYO ELECTRON Mercury MP
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ID: 9243803
System.
FSI / TEL / TOKYO ELECTRON Mercury MP is a high-performance photoresist equipment designed for use in semiconductor manufacturing. This system is designed to allow for the application of the exact desired lithographic pattern in the device fabrication process. Photoresist systems allow for the creation of patterned designs on a wafer substrate by exposing a photosensitive chemical to a patterned light source. FSI Mercury MP is ideal for a variety of photoresist processes, including both positive and negative resists, as well as dense and complex patterns. The unit offers a range of features to ensure the highest level of precision and performance, including an ultra-high-resolution scan head, advanced photon detection, and pulse compression. The pulsed laser source has a wavelength range of 400 to 800 nanometers for accurate and repeatable patterning. TEL Mercury MP machine also features multi-level pattern recognition, making it able to achieve uniformity and precision across a wide range of substrates. The tool is equipped with a graphical user interface that is easy to use, allowing for quick setup and operation. Additionally, the asset offers data analysis and graphic overlay functions, allowing users to accurately assess the results of their processes. Mercury MP is designed to achieve rapid pro- cess times and is ideal for high volume production. Additionally, the model features thermal features which protect sensitive parts and reduce the risk of thermal damage. The equipment is also designed to be highly reliable, featuring fully automated monitoring and diagnostic system to ensure optimal performance and a low failure rate. Overall, TOKYO ELECTRON Mercury MP is an ideal unit for photoresist processes, providing advanced features and reliable performance. With its multi-level recognition, high-resolution scan head, and automated monitoring and diagnostics, the machine is well-suited for achieving the desired lithographic pattern for any semiconductor manufacturing process.
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