Used FSI / TEL / TOKYO ELECTRON Mercury OC #9233651 for sale

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ID: 9233651
Wafer Size: 5"
Spray processor, 5" Single cassette, 5" Diameter, 14" A182-50MB Rotor / Turntable 5” Fed from central chemical distribution set up No separate chemical carts with chemical canisters.
FSI / TEL / TOKYO ELECTRON Mercury OC photoresist equipment is a high-precision tool used to deposit layer upon layer of a precisely dimensioned and accurately applied material on a specified substrate in order to recess or proactively shape the surface. The system is applicable for R&D and pilot-scale manufacturing for various micro-fabrication procedures within MEMS, semiconductor, and related industries. The standard functions of FSI Mercury OC unit are to accurately coat a substrate with a photoresist material, and to precisely define the pattern or profile of the photoresist pattern using a contact exposure tool or the direct serial writing tool found in the machine. The photoresist deposition process is typically used in electronic circuit fabrication and optoelectronic device production or prototyping. The contact exposure tool is responsible for creating the precise imaging patterns that are determined by the pre-defined reticles used in the tool. Depending on the reticles used, higher performance patterns can be created, thus enabling advanced features such as larger aspect ratios, non-rectangular shapes, 3D microstructures, and finer line widths. The direct serial writing process used by TEL Mercury OC is to modulate exposure energy across the scanning surface in order to achieve different imaging patterns for film patterning. The overall performance capabilities of Mercury OC asset is further enhanced through the use of a turbo pump vacuum model that allows for superior deposition uniformity, higher process speeds, and precise control of film thickness. Additionally, TOKYO ELECTRON Mercury OC also boasts a cooling equipment and humidity control which allows for more precise and repeatable processes. As a comprehensive photoresist system, FSI / TEL / TOKYO ELECTRON Mercury OC photoresist unit provides high-precision patterning capabilities to a variety of industries. The machine is designed for high-performance energy-efficiency and precise patterning, making it a leading choice in the manufacturing of MEMS, semiconductor, and optoelectronic devices.
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