Used FSI / TEL / TOKYO ELECTRON Mercury OC #9233652 for sale

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ID: 9233652
Wafer Size: 5"
Spray processor, 5" Single cassette, 5" Diameter, 14" A182-50MB Rotor / Turntable 5" Fed from central chemical distribution set up No separate chemical carts with chemical canisters.
FSI / TEL / TOKYO ELECTRON Mercury OC is a photoresist equipment designed to enable the production of high-resolution circuit patterns on wafers. It is a high-end system that enables circuit designers to produce patterns with great accuracy by utilizing the latest optics and stages. The unit is especially well-suited for the production of smaller components with tighter pitches and tight tolerances. FSI Mercury OC is a high-end machine that employs the latest technologies to produce extremely high-resolution patterns on a wafer. It utilizes a highly efficient electron beam that can be focused down to a microscopic size with almost no loss in resolution. This enables it to write sophisticated patterns with extremely small pitch sizes and tight tolerances. It also features a stage that enables a great deal of resolution even on the smallest features. In terms of optics, TEL Mercury OC utilizes a powerful optical tool that enables the asset to produce patterns with a very small spot size. This means that even on the most intricate circuit designs, the model can still produce patterns with a wide range of sizes, from extremely small micro-patterns to large complex feature patterns. The optics of the equipment also improves resolution and reliability by utilizing a laser stage. This type of stage allows the system to precisely place each feature, reducing the chances of defects and saving time. Additionally, the high-end optics provide greater output control and improved throughput. Finally, Mercury OC uses a computer-controlled process controller to ensure the most accurate pattern placement. This ensures that all patterns are printed accurately and reliably with no errors.Overall, TOKYO ELECTRON Mercury OC is a powerful, reliable unit for the production of high-resolution circuit patterns on wafers. It utilizes an advanced optics machine and cutting-edge processeses to ensure that the patterns produced are of the highest quality and accuracy. These technologies are combined with a computer-controlled process controller to ensure the most accurate and reliable pattern placement.
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