Used FSI / TEL / TOKYO ELECTRON Polaris 2000 #9202286 for sale

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ID: 9202286
Coater / Developer system Cooling system With STAUBLI unimation robot Computer controlled Monitor Keyboard With micro bar mini trackmate control cabinet IDI Pumpless pump Controller Touch screen control Developer control.
FSI / TEL / TOKYO ELECTRON Polaris 2000 photoresist equipment is a multi-functional, low-volume, CASS/Lithography system used for integrated circuit production. FSI Polaris 2000 is a full die size photoresist unit featuring a scribing area coverage of up to 12-inch wide wafers. The machine is designed with process flexibility and scalability in mind, providing photolithography processes for multi-layer device production. The tool utilizes a photoresist asset and Computar-assisted photo-lithography (CASS) to accurately and precisely apply a single layer of photoresist to a multi-layer device. The machine is equipped with a 6.5KW capacitive power supply, a multi-waveform generator, and dual-zone heating for uniformed curing of the layers. The power supply offers both precision and a wide variety of power levels allowing for improved precision and repeatability while CASS and multi-zone permit accurate alignment, resolution, and exposure of the photoresist. The model allows for accurate dispense of photoresist solution in a controlled environment. The two-step dispense process; the first step uses a variable-speed dispense pump and the second step utilizes an adjustable air knife to shape and control the flow of photoresist on the target layer. The machine also features adjustable air knives allowing flows up to 12" wide as well as rate and volume control. The automated pod loading and unloading features permit full automation of substrate loading/unloading and provide integration-ready integration with other FSI systems. The machine also provides a variety of enhancement options such as digital image analysis, automatic film thickness measurement, and improved data reproducibility. The Polaroid 2000 equipment is capable of process times ranges of under 12 seconds to to nearly 12 minutes, and can provide layer thickness as low as 0.3 microns and as high as 600 microns. The system can achieve a film repeatability within 6nm from layer-to-layer with and also features vision positioning up to 200nm. In summary, TEL Polaris 2000 photoresist unit is a multi-functional, low-volume, CASS/Lithography machine used for integrated circuit production features an integrated power supply, multi-waveform generator, dual-zone heating, and automated pod loading/unloading for improved performance and accuracy for wafer scribing. The tool has a wide range of process times and allows for precision resolution and repeatability.
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