Used FSI / TEL / TOKYO ELECTRON Polaris 2000 #9278707 for sale

FSI / TEL / TOKYO ELECTRON Polaris 2000 is a photoresist equipment designed to support the fabrication of a wide variety of devices. The system uses a liquid chemical compound, known as photoresist, which undergoes a reaction when illuminated with light. Light selectively exposes the photoresist material allowing the patterning of the photoresist layer to be accomplished using a computer-controlled light beam. FSI Polaris 2000 is an ultraviolet exposure tool which is suitable for the production of myriad designs in terms of accuracy. This unit is an ideal choice for making any kind of microelectronic device and has a lithography performance with an ultraviolet laser output of up to 300 mW/cm². The tool is equipped with advanced control capabilities, including a true two-dimensional internal wafer stage, z-stage, a rotation stage, auto-exposure or manual-exposure, and a humidity control unit. The machine is also equipped with a variety of automated process control features including a dark field tool, various kinds of focus development techniques, film thickness control, and enhanced process control. TEL Polaris 2000 can also be used as a stepping tool providing flexibility when developing a pattern using this photoresist additive approach. This asset enables the generation of multiple patterns utilizing a single masked wafer and the precision patterning of a wide range of substrates and device geometries. The built-in auto-alignment feature of the tool allows for greater accuracy and alignment of multiple layers on a single wafer. When it comes to maintaining optimal working conditions for a photoresist model, Polaris 2000 offers a range of environmental control features. This equipment has a built-in filter system for humidity and temperature control, as well as a built-in vibration isolation table which reduces the influence of external conditions on the process. To maximize the reliability of the photoresist development process, TOKYO ELECTRON Polaris 2000 also features a constant output power monitoring unit, as well as a built-in focus ratio monitoring machine. In conclusion, FSI / TEL / TOKYO ELECTRON Polaris 2000 from FSI is an advanced photoresist tool designed to support the fabrication of a wide variety of devices. The asset is equipped with advanced control capabilities for versatile lithography performance while also having sufficient environmental control features for optimal working conditions. This model can be used as a stepping tool providing flexibility and precision when developing a pattern, and is ideal for any kind of microelectronic device.