Used FSI / TEL / TOKYO ELECTRON Polaris #9212671 for sale

FSI / TEL / TOKYO ELECTRON Polaris is an advanced photoresist equipment developed and manufactured by FSI Ltd. The system is designed for high-accuracy and high-throughput patterning of photoresists used in semiconductor processing applications. The unit is capable of producing patterns down to 50 nm in size with excellent accuracy and repeatability. The machine consists of an advanced deposition and patterning process that allows for the accurate and high-throughput creation of fine patterns in photoresists. The first stage of the process is the deposition of a photoresist layer onto the wafer surface. This photoresist is then exposed to a source of light, such as a laser, and the photoactive ingredients in the photoresist react with the light energy creating a pattern, or pattering, in the photoresist. The tool then uses a solvent to etch away the photoresist in the areas not exposed to the light source. This creates the desired pattern in the photoresist. FSI Polaris asset is equipped with a high-precision automated scanner for the deposition and patterning process. This scanner is capable of accurately positioning and controlling the light source as well as the photoresist deposition. The model also includes advanced software that allows for the precise control of the patterning process. This software allows for the adjustment of the light intensity, pattern size and shape, and other parameters. TEL Polaris equipment also includes a wide range of processes and equipment to process the exposed photoresist. These processes include baking and developing the photoresist, as well as etching and cleaning the exposed photoresist. The system is also capable of creating complex patterns, such as through hole vias and multi-layer patterns, with ease and accuracy. In conclusion, Polaris unit is an advanced photoresist machine designed for producing highly-accurate and high-throughput photoresist patterns. The tool is equipped with a high-precision automated scanner, advanced patterning software, and a wide range of processes and equipment for processing the exposed photoresist. The asset is capable of creating complex patterns down to 50 nm with excellent accuracy and repeatability.