Used JEOL JFC-1600 #9261178 for sale

JEOL JFC-1600 is a photoresist equipment designed to generate fine structures on a substrate using a combination of light and UV radiation. This device uses a high-precision mask aligner, which is capable of accurately positioning a pre-patterned and pre-exposed photoresist mask onto a substrate. The mask aligner has a stage resolution of 200-sub-micron, allowing for high precision lithographic patterning. JEOL JFC 1600 utilizes i-line ultraviolet light for exposure. This light is used to expose the sensitized substrate layer, initiating a chemical reaction with the photoresist to form a durable pattern. In order to control the exposure energy and the optical profile of the exposed substrate layer, the intensity of the light is adjustable. In addition to light exposure, JFC-1600 also provides an etching process. The etching process uses plasma in a controlled environment to generate the desired pattern on the substrate. The plasma etching process ensures a clean surface with high accuracy, eliminating any remaining residues from the photoresist film. JFC 1600 utilizes a track placement system in order to quickly and accurately position the desired pattern onto the substrate. This unit simplifies the lithographic patterning process, ensuring that the exposed substrate is accurately placed and aligned. Lastly, JEOL JFC-1600 also provides a heating machine, which enables high-temperature substrate bonding. This process is highly important in ensuring the desired pattern adheres securely to the substrate layer. The high temperature bonding process also allows for improved adhesion of the pattern to the substrate surface. JEOL JFC 1600 is a highly efficient and accurate photoresist tool which provides precise control over the patterning process. This device is able to generate fine lithographic patterns within tight tolerances, ensuring the desired pattern adheres securely to the substrate.