Used KAIJO RT-844A #9134688 for sale

KAIJO RT-844A Photoresist Equipment is a precise, automated system used for coating photoresist on semiconductor substrates. The unit is suitable for use with a wide variety of photoresist. It is suitable for applications such as photolithography, thin film deposition, etching, pattern transfer, and dielectric deposition. The machine consists of a four-stage chamber, a spin coater, two spin stacks, and a transport tool. The first stage of the chamber, the pre-processing stage, is equipped with an adjustment mechanism that allows the photoresist to maximize quality results. It also includes a ventilation asset to reduce static build-up. The second stage is the photoresist coating chamber. This chamber has a spin coater, two spin stacks, and a turbo pump. The spin coater controls the angle and speed of the spin, and can be easily adjusted for a variety of photoresist formulas. The two spin stacks support two spin coaters at the same time, decreasing cycle time and increasing throughput. A turbo pump evacuates the chamber instantly, ensuring the coating remains even and uniform. The third stage is the exposure chamber. The model has a high-resolution display that allows for precise adjustments of exposures. It also has a beam profile monitor that helps ensure that the desired exposure level is reached. The exposure chamber also has a multi-pattern mask aligner that allows for quick and precise alignment. The fourth stage is the post exposure bake chamber. This chamber is used to heat the photoresist in order to ensure that it reaches its optimum properties. A temperature-controlled heater ensures that the photoresist is heated to the desired level. The equipment also has a timer to control how long the photoresist will be baked, allowing for accurate and consistent results. Overall, RT-844A photoresist system is a reliable, precise unit that can be used for a wide variety of photoresist applications. With its four-stage chamber, spin coater, two spin stacks, and exposure chamber, the machine provides excellent and consistent results. It is ideal for use in photolithography, thin film deposition, etching, pattern transfer, and dielectric deposition.