Used SEMITOOL 870F/L #9266741 for sale

SEMITOOL 870F/L is a Photoresist Equipment designed to provide precise coating and developing of photoresists. It is ideal for a variety of applications including semiconductors and displays. The system comes with advanced features such as a two stage densitometer, integrated photoresist mapping unit, programmable spray and processing parameters, and automated speed control for uniform substrate coverage. The machine can deliver a maximum performance of 3.5% uniformity across the substrate. The tool comes with two processing chambers - the front chamber (the spray chamber) and the rear, laminar flow chamber (the strip chamber). In the spray chamber, a double sided spray arm is employed to evenly deliver the photoresist material to both sides of the substrate. The droplets are then passed through two separate, independently operated spinners that are fine tuned for each application. This helps achieve optimal uniformity of the photoresist layer across the entire substrate. The strip chamber is used to provide the substrate with a uniform clean-down of the photoresist layer. This chamber incorporates a laminar flow technology which ensures precise removal of the photoresist layer. The chamber is equipped with a high precision nozzle that enables the proper depth of etching for all substrates. This process is also highly repeatable and ensures highly accurate results. The 870F/L photoresist asset also incorporates a set of advanced features that ensure its reliability and effectiveness. The model contains a reliable densitometer, allowing for accurate measurement of the photoresist layer thickness. Additionally, the integrated mapping equipment helps to accurately detect and trace defects on the photoresist layer. This helps to ensure the highest quality and repeatable production standards. SEMITOOL 870F/L photoresist system is an advanced and reliable piece of equipment that provides an efficient solution for photoresist processing and is ideal for a range of applications. The combination of features that the unit contains enable it to deliver a uniform layer of photoresist material, a precise clean-down procedure, and accurate measurement of the layer thickness. This ensures that the process remains precise and consistent.