Used TEL / TOKYO ELECTRON ACT 8 #9122207 for sale

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TEL / TOKYO ELECTRON ACT 8
Sold
ID: 9122207
Wafer Size: 8"
Vintage: 2001
(2) Coaters SOG system, 8" Wafer type: Notch Signal tower: ETC (3-lamp) Main controller version: Version #2 Software version: N/A Inline: No DUV (chemical filter): No Manual operation: No Cassette block: Normal type (TEL STD) Process block: Single block SOG Coater: 2-3, 2-4 High hot plate (HHP): 2-13, 2-14, 2-21, 2-23, 2-24 Low hot plate (LHP): 2-11, 2-21, 2-12 Chill plate (CPL): 2-5, 2-9, 2-15, 2-17 Transition stage (TRS): 2-8/2-7 TCP Thinner chemical supply: CCSS (2 buffer tank) (1) AC Power box (1) Cup temp/humi: ESA-2S-T-01 (1) Temperature controller: INR-211T-24 (2) pumps, (4) CPL (1) Chemical cabinet Missing / Damaged parts: LCD DC Power supply 2001 vintage.
TEL / TOKYO ELECTRON ACT 8 is a type of photoresist equipment which incorporates advanced technology to enable its use in photolithography systems. The photoresist system is important for creating microstructures on substrates such as wafers and digital camera lenses. This photolithography unit allows for the formation of these microstructures on wafers or lenses with extreme precision. TEL ACT 8 is comprised of several important components. Its control machine integrates the use of powerful programmable logic controller (PLC) technology. This controls the sequence of operations of the equipment which is needed to apply the photoresist. It also monitors exposure levels of the photoresist. The automation technology used is highly precise and allows for precise tailoring of the processes involved. TOKYO ELECTRON ACT 8 features built-in computation functions to ensure accuracy and reliability of its output. It has capacity for up to 192 steps for the exposure of photoresist. This allows highly customised exposure of photoresists that is both precise and reliable. The tool also offers a wide array of memory modules with up to 8Mb of storage capacity. This allows for comprehensive storage of exposure data as well as other necessary information. The photoresist systems is further equipped with the Nikon/Vistion proprietary film-measurement algorithm. This feature ensures precise measurement of exposures which allows better overall accuracy of the processes involved. TEL ACT 8 also features a unique chip with two 16-bit high-speed processors. This enhances the asset's capabilities and helps optimise the performance of the chip in terms of reliability and accuracy. When it comes to safety, TOKYO ELECTRON ACT 8 is equipped with a fail-safe model. This feature is important as it ensures that the unit does not malfunction due to an unexpected incident. The safety feature helps mitigate the potential of any serious problem or failure that may occur during operation. Overall, ACT 8 is an advanced yet intuitive photolithography equipment. It offers a level of precision that encourages flexibility of its use in multiple contexts. The advanced technologies incorporated helps enhance the accuracy of the photoresist system, allowing for high quality output.
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