Used TEL / TOKYO ELECTRON ACT 8 #9311769 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

TEL / TOKYO ELECTRON ACT 8
Sold
ID: 9311769
(2) Coater / (2) Developer system (4) Uni-cassette stations (2) Chill plate units (2) Adhesion units (9) LHP Transition unit Transition chill plate unit Type 4 ACT controller Number of resist nozzle: (3) Nozzles per COT unit: 2-1, 2-2 COT Nozzle 1: HV Pump (Iwaki HV-115-1) 2-1, 2-2 COT Nozzle 2: RRC Pump (F-T 100-3) 2-1, 2-2 COT Nozzle 3: No pump, no LE tank Developer nozzle Stream nozzle Components: (3) INR-24-264A Circulating pumps (3) INR-244-216C Circulating pump power supplies (2) INR-244-217B CPL Power supply modules Controller: INR-244-218F.
TEL (TEL / TOKYO ELECTRON ACT 8) is an advanced photoresist equipment developed by TOKYO ELECTRON to enable efficient, accurate and reliable processing of advanced materials, such as those used in the manufacture of semiconductors, high-density integrated circuits and other electronics components. The system employs a variety of technologies for its operation, including lithography, ultraviolet light exposure and etching. TEL ACT 8 machine is one of the most sophisticated photoresist systems available. It features a fully automatic and user-friendly interface, allowing for easy and efficient operation and setup. The unit also includes a broad range of accessories, providing a variety of features to ensure accurate and consistent results. These include highly precise control valves, sophisticated pulse control circuitry, a motorized sample holder, a high-voltage generator, a quartz lamp insertion and removal machine, and an anti-static control unit. Lithography is used to image photoresist coatings onto semiconductor wafers using ultraviolet light. By manipulating the light intensity and the angle of incidence, photoresist can be accurately made to form the desired shapes and patterns on the wafers. TOKYO ELECTRON ACT 8 is equipped with advanced lithography technology to enable precise control and positioning of the light, resulting in high-precision patterns. The tool also incorporates a flow-through process, allowing for rapid etching of photoresist from the wafer. With its high-speed and high-pressure ability, the machine is able to quickly etch off unused photoresist from the surface of the wafer. This process stage is essential for the accurate and reliable fabrication of circuits. TEL ACT 8 asset also includes an ultraviolet light exposure section. The machine is equipped with a quartz lamp source and an ultra-fast data acquisition model, which allow for fast exposure of UV light onto the wafers. The highly efficient data acquisition equipment can accurately measure and store the output of the light for further processing. Finally, the machine is equipped with a variety of safety features, including an anti-static system and a housing that helps protect personnel from exposure to harmful particles. The anti-static unit is designed to reduce the potential for static electricity, which can damage or reduce the efficiency of photoresist. In conclusion, ACT 8 is one of the most advanced photoresist systems available. Its combination of lithography, ultraviolet light exposure, etching and safety features makes it an invaluable tool for the fabrication of advanced integrated circuits. This machine helps to ensure the accurate and reliable production of semiconductors, high-density integrated circuits and other electronics components.
There are no reviews yet