Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9154831 for sale

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TEL / TOKYO ELECTRON Clean Track ACT 12
Sold
ID: 9154831
Wafer Size: 12"
Single block coater / developer systems, 12".
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment which provides users with an efficient and fast process to develop photoresist on substrates. This system allows users to create high-resolution images on the wafer surface and thus reduce the time required and improve the quality of their products. The unit works by exposing light to the substrate through a mask, which is then stabilized with a vacuum. This enables the substrates to develop negative or positive images that can be used for manufacturing. The photoresist is held on the surface, and the vacuum stabilizes the layer. The most important feature of this machine is that no manual contact is required between the layers and the substrate, as the vacuum does the job of stabilizing the geometry and pressure of the photoresist. The photoresist is removed from the surface after the exposure to light is complete. It is then redeveloped by spinning the substrate within a chamber filled with a liquid photoresist. The photoresist on the surface is further hardened by the spin of the substrate and the liquid is then drained away from the surface. This process improves the performance of photoresists as it forms a thin and uniform layer. TEL Clean Track ACT 12 offers users the accuracy and precision to produce high-resolution, high-precision photosensitive components. The tool also offers superior cleanliness to substrates, thanks to its high-vacuum level. The asset also offers exceptional track accuracy when moving the substrate between the mask and substrate, allowing for precise and accurate exposure. Overall, TOKYO ELECTRON Clean Track ACT 12 offers users a reliable and efficient way to produce photosensitive components. The model works by exposing light to the substrate, stabilizing the layer with a vacuum, removing the photoresist, and then redeveloping it using spin within a chamber filled with a liquid photoresist. The equipment provides excellent cleanliness, accuracy, and precision, providing users with the highest level of quality in photosensitive components.
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