Used TEL / TOKYO ELECTRON Clean Track Mark 8 #293628320 for sale

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ID: 293628320
Wafer Size: 8"
Vintage: 2000
Resist coater / Developer system, 8" Single block Controller type: NEC-PC-9800 Wafer direction: Right to left AC Power box TCU: (2) Electronic controllers Hard Disk Drive (HDD) not included AC power cable: 1 Phase 2000 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment designed for high precision and fine patterning. The photoresist system is designed to expose a fine, uniform pattern onto a substrate, such as a silicon wafer, and is used in the fabrication of innovative semiconductor devices. This unit uses a submergible track scanner, which consists of a main body, a projection objective and drive systems. The submergible track scanner is connected to a track controller, which controls the various parameters for the machine. The projection objective is connected to the track scanner, and it is submerged in a liquid photoresist solution. The projection objective is used to focus light onto the photoresist, and the drive systems allow for accurate x, y, and z positioning of the pattern onto the substrate. The tool can generate uniform, high precision patterns, with a precision of up to 0.1 microns and a patterning of up to 0.2 microns. The photoresist also provides stability, meaning it is not affected by temperature, pressure, or age. This makes it ideal for use in the fabrication of semiconductor devices, as high precision, accurate patterns are required. TEL Clean Track Mark 8 asset is ideal for those who need a reliable, accurate way of patterning thin resist layers on their substrates. The model can deliver uniform, high-precision patterns with accuracy of up to 0.1 microns, and the photoresist used is unaffected by age, temperature and pressure. Finally, this equipment can also be used to produce high-density, three-dimensional patterns, ensuring that innovative devices can be produced with greater precision and accuracy.
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