Used TEL / TOKYO ELECTRON I/F Block for Clean Track Mark 8 #293658866 for sale

TEL I/F Block for Clean Track Mark 8 is a photoresist equipment designed for precision exposure of photoresists to create patterned film images onto substrates. It is precision-engineered to be a cost-efficient, high-throughput, user-friendly tool for exposure and image development. The system features a modulation scan of approximately 20m/s for a 6-inch substrate, allowing users to minimize exposure times and reduce photo-induced image blur. It also features automatic wafer alignment with a maximum positional accuracy of 0.1µm and a full image edge to edge scan of the substrate. The unit utilizes a high-quality optical imaging machine to ensure a wide-range of image forming capabilities. It is designed with a two-piece cast-iron grid for total control over substrate jitter and the axial tilt is adjustable for precise and repeatable image placement on the substrate. The device's automatic-leveling tool utilizes a high-speed linear drive, precision encoders and a Z-axis galvanometer controller to ensure accurate and repeatable substrate positioning. The asset is designed to minimize temperature-related expansion and contraction of the optical path, allowing for superior imaging performance. TOKYO ELECTRON I/F Block for Clean Track Mark 8's advanced exposure controller utilizes a graphical user interface for user-friendly operation. The integrated PARADITM software package allows users to optimize imaging parameters such as exposure times, spot size, and focus for maximum exposure precision. Finally, the model is designed to provide superior imaging performance over a wide range of photoresist coatings. The precision exposure equipment is optimized for optimal performance when used with TEL / TOKYO ELECTRON proprietary lithography products. Furthermore, the device is compatible with various third-party photoresist products. TEL I/F Block for Clean Track Mark 8 is designed to provide users with an advanced exposure system for cost-efficient, high-throughput, and user-friendly photoresist imaging. Its design features ensure superior imaging performance and maximum exposure precision.