Used TEL / TOKYO ELECTRON Mark 7 #9006831 for sale

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TEL / TOKYO ELECTRON Mark 7
Sold
ID: 9006831
Wafer Size: 8"
(1) Coater / (2) Developers system, 8".
TEL / TOKYO ELECTRON Mark 7 photoresist equipment is a precision tool used in microelectronic devices and semiconductor devices. It is used for the rapid and accurate transfer of photomask patterns into semiconductors and wafers. The transfer is done via an imaging system, which uses light to form a pattern on the wafers. The unit uses high-resolution optics and advanced light sources for accurate imaging. The machine is capable of resolving features smaller than 0.2 μm, which is approximately 1/20th the diameter of a human hair. This is very important for high-precision devices such as semiconductor memories and GPUs. The tool also uses advanced hardware and software to ensure that the photomasks used are accurately aligned to the wafers, so that no light escapes from any area. TEL MARK7 photoresist asset is capable of rapid exposure of large-area photomasks. This significantly reduces production time and cost for both large-area and small-area production processes. The model is also equipped with an auto-alignment and focus control equipment, which ensures that all pattern features are accurately processed and the wafers are clean and defect-free. In addition, TOKYO ELECTRON MARK-7 photoresist system offers excellent repeatability, meaning that the same wafers can be processed multiple times with the same results. This is very important for high-volume production. Finally, the unit also offers compatibility with standard wet processing materials, including a variety of photoresists, photoresist solvents, developers, strippers, cleaners, and etching solutions. In summary, TEL / TOKYO ELECTRON MARK7 photoresist machine is a precision instrument designed for the accurate transfer of photomask patterns into the wafers used in microelectronics and semiconductors. It features high-resolution optics, advanced light sources, and auto-alignment and focus control systems for accurate pattern processing. It also offers rapid exposure of large-area photomasks and excellent repeatability, and is compatible with standard wet processing materials.
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