Used ULTRA OPTICS Mini II #9259818 for sale

ULTRA OPTICS Mini II is a high performance photoresist processing equipment designed to meet the needs of high-end users such as semiconductor manufacturers and research institutions. It is equipped with a powerful 360W automated excimer laser capable of precision patterning over a wide exposure wavelength range. In addition, the high resolution and stability of the optics-based system allows for reproducible imaging of features down to 10μm in width and thickness. The optional automated OPC module can be used for the design, verification and production of complex patterns. Mini II utilizes a specialized, high-resolution prism optical unit to generate uniform, monochromatic images of photographic masks and original patterns under UV illumination. A precise size detector is included, which helps the machine maintain stable exposure control and minimize pattern distortion. The user interface is designed to facilitate intuitive and easy usage, and offers the user manual and automatic control for a variety of processing programs, allowing for quick and optimal arrangement of exposure parameters. In addition, the tool includes a recipe-enabled master/slave mode, which allows the user to overlap and compare different parameters, logging process data for quality analysis and control. Finally, the asset is loaded with a highly intuitive software package that provides advanced control for automatic feature recognition and assists the user in the development of their required processes. Real-time processing data logging, pattern recognition, and error-prevention systems are all included in the package. In sum, ULTRA OPTICS Mini II is a versatile, easy-to-use, and quality photoresist processing model that provides users with precise and reliable results. It is ideal for the development of more complex processes and features a user-friendly interface for both new and experienced photoresist users.