Used ULTRA OPTICS Mini II #9316392 for sale

ULTRA OPTICS Mini II is a state-of-the-art photoresist equipment designed for microelectronic component fabrication. This system has been engineered to meet the requirements of the world's leading semiconductor manufacturers, offering maximum performance with superior uniformity and accuracy. Its advanced optics design provides superior focus and intensity, and its precision frame ensures that components are accurately positioned. The unit consists of a precision positioning frame and a UV source, which is adjustable for wavelength and intensity. The positioning frame is designed for easy loading, unloading, and re-positioning, allowing for flexible mask alignments. The advanced optics design and sophisticated electronics minimize pattern distortion. Mini II is capable of processing thin-film, thick-film and ultrafine feature resolution. It offers high throughput node programming and can process up to five times more dies than other photoresist systems. The machine includes a range of masks and software tools to produce electronic components with superior quality and uniformity. The advanced tool allows accurate programming of mask patterns, as well as precise positioning of the mask to the precision positioning frame. ULTRA OPTICS Mini II is also able to detect any mask misalignment, allowing for immediate correction and preventing any further errors. The asset's reliability and superior performance make it an ideal choice for high-volume production applications. The model is designed to withstand harsh environment conditions and can work seamlessly across multiple process steps. Its non-contamination design also ensures that components are consistently produced with the best possible yield and reliability. In addition, the equipment is designed for ease-of-use, allowing users to create complex components quickly and reliably. The system also comes with optional automation components,such as automatic pattern adjustment to ensure product consistency. The unit is also supported with regular upgrades and maintenance, allowing users to achieve maximum machine performance and reliability. Mini II is a cost-effective, high-performance photoresist tool, designed to meet the needs of microelectronic component fabricators worldwide. With its superior focus, motion, and optics design, ULTRA OPTICS Mini II ensures superior performance and reliability, making it the perfect choice for high-volume production applications.