Used ULTRA OPTICS Mini II #9316421 for sale

ULTRA OPTICS Mini II is a full-featured photoresist equipment for use in lithography and thin-film processes. It is ideal for applications such as printed circuit board design, wafer patterning, and OLED fabrication. The system utilizes powerful yet user-friendly software and precision optics to generate reliable results. The unit has a fast vacuum-stage scanning machine, with a maximum speed of 600 µm/s and a resolution of 0.17 µm, enabling high-speed production of repeatable patterns. The scanning tool also features quick-change optics, allowing easy installation of different lenses for different objectives or processes. It is also compatible with a variety of resist films, including positive and negative resists and photosensitive polymers. Mini II also features a wide range of exposure options, with exposure time increments as short as 10 milliseconds. It has an intuitive setup wizard that simplifies process setup, and provides automatic exposure control while also letting users fine-tune settings for precise results. It has a range of imaging capabilities, such as two-dimensional field masking, which can create thorough patterns quickly and accurately. The asset is also equipped with an advanced model controller to continually monitor process parameters and make adjustments accordingly. It has a built-in temperature and humidity control equipment to ensure uniform exposure. The system is also compatible with a variety of imaging processing and inspection software, making it a flexible solution for manufacturing. ULTRA OPTICS Mini II is a powerful and easy-to-use solution for any photoresist-based production environment. It offers reliable and accurate repeatable results for a range of applications, including printed circuit board design, wafer patterning, and OLED fabrication. With its fast scanning unit, wide range of exposure options and efficient setup wizard, Mini II is an efficient and user-friendly option for photoresist production.