Used VERTEQ SuperClean 1600 #9243729 for sale

VERTEQ SuperClean 1600
Manufacturer
VERTEQ
Model
SuperClean 1600
ID: 9243729
Wafer Size: 8"
Vintage: 2006
Spin Rinse Dryer (SRD), 8" 2006 vintage.
VERTEQ SuperClean 1600 is a photoresist equipment that has been designed to provide exceptional results when processing wafers and substrates. This system is ideal for precision-sensitive applications requiring high-level cleanliness, as it allows for deep cleans and removes photoresist residues at the same time. SuperClean 1600 allows engineers and professionals to optimize the process of removing photoresist material from a substrate. The unit removes photoresist material by employing a mechanism known as a "cold plasma" process. A cold plasma process is a non-thermal method of cleaning that takes advantage of a stream of ions and radicals that pass through a plasma chamber. By aiming an intense beam of activated ions and radicals at a substrate, the machine removes the resist particles from the surface. Additionally, the process does not generate any harmful byproducts or create any additional contamination on the substrate. VERTEQ SuperClean 1600 is a powerful, efficient, and versatile photoresist tool. It is capable of handling a variety of operations, including wet and dry processes, with ease. Its low peak temperature control ensures that fragile wafers and other substrates remain intact while allowing for maximum cleaning power. Additionally, a powerful vacuum asset within the unit allows for quick and efficient resist removal. This model is also equipped with advanced safety features such as illuminated chambers, overheating alarm, and a double-wall design that helps protect against abrasive particulates. SuperClean 1600 photoresist equipment is a reliable and robust unit that is perfect for substrates that require the utmost in cleanliness. With its numerous features, such as a durable construction, reliable accuracy, and quick removal of photoresist, this system allows technicians to confidently process substrates and wafers with precision and speed.
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