Used VARIAN E11000090 #9067642 for sale

VARIAN E11000090 is an ion implanter and monitor, designed for precision semiconductor processing. It uses a variable energy ion beam, which can be fed with different gas or vapor sources and then directed into a target material. E11000090 controls the energy and flux of the ion beam to ensure the highest quality implants are able to be achieved. VARIAN E11000090 is designed to allow for a much higher level of implant accuracy, due to its superior accuracy and repeatability characteristics. It has a resolution of 0.5nm, making it ideal for establishing precise implant profiles in nanofabrication applications. It can handle both high- and low-energy ions, and its total beam current of up to 30mA allows for a wide range of implant profiles. The unit also features adjustable power supplies for highly accurate ion beam energy control, as well as a variety of integrated safety features for secure operation. E11000090 utilizes a unique beam monitor system, which enables highly accurate implantation-to-monitoring operations. This system measures the actual beam current at the target and helps to ensure that the implant profile remains within the desired parameters. It also includes a variable dwell time feature, which enables the user to adjust the implantation time in order to achieve the best results. The unit has a range of integrated safety features for added security, including a floating chamber gate to avoid gas leaks during in-situ ion implantation and/or constant current monitor to measure beam current in real-time. These features help to ensure that your implantation is executed with pristine consistency. VARIAN E11000090 is an advanced ion implanter and monitor, designed with superior accuracy and repeatability characteristics in mind. Its range of adjustable power supplies, integrated safety features, and advanced beam monitor system make it an ideal choice for precision semiconductor processing applications.