Used AG ASSOCIATES Heatpulse 8108 #9146304 for sale

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ID: 9146304
Wafer Size: 5"-8"
Rapid thermal processor annealing systems, 5"-8" Includes: Process chamber: Two high-intensity tungsten halogen lamp arrays STD Bus for real-time operation Quartz isolation tube Robot / Robot controller Gas control electronics ULPA Filtration system Graphic user interface (GUI) computer system Electronics Mass-flow-controlled gas handling Cooling ULPA Filtration Mechanical assemblies Applications: Silicon dielectric growth Implant annealing Glass re-flow Silicide formation and annealing Nitridation of metals Contact alloying Oxygen donor annihilation Wafer handling: Automatic serial processing Standard cassettes Throughput: Process dependent Ramp-up rate: Programmable Range: 1 – 180°C Per second Steady-state duration: 1 – 600 Seconds per step Ramp-down rate: Programmable Temperature Radiation dependent Range: 1 – 180°C Per second Maximum: 150°C per second Steady-state temperature range: 400 – 1200°C ERP Temperature accuracy: +3°C to -7°C Calibrated against an instrumented thermocouple wafer (ITC) Temperature repeatability: + 3°C Temperature uniformity: + 5°C Includes: Manuals.
AG ASSOCIATES Heatpulse 8108 is a rapid thermal processor designed for efficient and accurate thermal processing. It is suitable for a wide range of thermal applications, including rapid thermal processing of semiconductor substrates, thin films, optoelectronics, and MEMS devices. The 8108 is a full-featured rapid thermal processor, offering a temperature range of 50°C to 1200°C and a uniformity of temperature across the sample of ±50°C, as well as fast thermal cycling times from 30 sec to 6 minutes. The 8108 is equipped with AG ASSOCIATES IPM-6000 Thermal Processor Control System, providing precise temperature control and support for multiple substrate types and sizes. The IPM-6000 offers an intuitive user interface and programmable thermal profiles, allowing users to quickly and easily create custom thermal processes. It also features an array of optional accessories, including heating element temperature monitors, short range infrared sensors, high temperature pyrometer and pyrography modules. The 8108 comes with a metal halide lighting system, allowing for processes to be monitored in real time. A heavy-duty, corrosion-resistant stainless-steel chamber is also included, preventing oxidation and potential contamination of the samples. The chamber also features slotted shelves designed to optimize thermal uniformity. The 8108 is designed to meet a variety of thermal processing needs, providing rapid, efficient, and accurate thermal processing. It is an ideal choice for applications in semiconductor research, thin film deposition, MEMS device fabrication, and electronics packaging. With its advanced features and user-friendly design, AG ASSOCIATES HEAT PULSE 8108 is an ideal tool for a wide range of thermal processing applications.
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