Used DNS / DAINIPPON LA-3000F #9009841 for sale

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DNS / DAINIPPON LA-3000F
Sold
ID: 9009841
Wafer Size: 12"
Lamp anneal system, 12".
DNS / DAINIPPON LA-3000F is an advanced rapid thermal processor designed for high-speed, low-cost thermal processing of semiconductor wafers. It is equipped with a ceramic E-Beam source, advanced temperature control, and precise temperature uniformity over the entire wafer surface. The Electronics Beam (E-Beam) source used in DNS LA-3000F is designed for high-speed processing with a low drift and line-of-sight illumination. The device also features a quartz light-trap and an enthalpy balance chamber for improved temperature uniformity and reliability. It utilizes more powerful heating elements and a larger chamber than most other rapid thermal processors. This results in a rapid temperature ramp-up rate and rapid heat transfer for uniform heating across the entire wafer surface. DAINIPPON LA-3000F is equipped with an advanced temperature controller, providing precise temperature control from 50°C to 1100°C in increments of 0.1°C. It is also equipped with a high-accuracy uniformity sensor that monitors the temperature across the entire wafer surface in real-time and adjusts the temperature accordingly. This ensures uniform heating and cooling of the wafer within a certain tolerance. Furthermore, the device includes a fast chart recorder which can record temperatures at up to one second intervals. LA-3000F includes a number of safety features that ensure reliable and efficient operation. Its quartz light-trap and enthalpy balance chamber eliminate stray photons and thermal imbalances produced by the E-Beam. It also features an automatic recover system which recovers recipes that are interrupted during processing. Finally, its ceramic wafer carrier ensures accurate wafer alignment while the quartz window ensures safety from explosions. DNS / DAINIPPON LA-3000F is an ideal device for rapid thermal processing of semiconductor wafers and is an essential component of many advanced manufacturing plants. It offers precise temperature control, rapid heat transfer, advanced safety features, and improved uniformity for optimized performance. It is an ideal choice for high-speed, low-cost thermal processing.
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