Used AIXTRON 2400G3 HT #9254482 for sale

AIXTRON 2400G3 HT is a state-of-the-art vertical reactor designed for the deposition of advanced thin film materials, such as high quality III-V compounds for semiconductor device production. It incorporates many of the same powerful features as standard AIXTRON systems, but adds an innovative HT design for increased throughput and improved production. With its advanced control systems, AIXTRON 2400 G3-HT offers users the greatest level of flexibility and performance in their production processes. 2400 G3 HT utilizes a three-chamber design and features a loadlock chamber, a working chamber, and an unloading chamber, each with separate temperature controls for improved thermal stability. The working chamber features an effusion source capable of heating materials up to 1200°C, and it can also be cooled independently. The working chamber is enclosed inside a HiPIMS (High Power Impulse Magnetron Sputtering) type magnetron with a strong magnetic field that allows for large and small area deposition. 2400 G3-HT also incorporates a high-accuracy optical path for monitoring of the deposition process. In order to get the best performance from AIXTRON 2400 G3 HT, it is important to carry out frequent maintenance and calibration. This includes regular cleaning of the loadlock and working chambers as well as calibration of the optical path to ensure the highest precision deposition. In addition, 2400G3 HT can be equipped with advanced process control systems such as in-situ monitoring and advanced plasma/metrology solutions to ensure the best material results. Overall, AIXTRON 2400G3 HT is an ideal tool for high-performance materials deposition for high-tech applications. With its advanced features and precise control systems, users can expect maximum efficiency and top-notch material results from this powerful reactor.