Used AIXTRON 2400G3 HT #9270060 for sale

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AIXTRON 2400G3 HT
Sold
Manufacturer
AIXTRON
Model
2400G3 HT
ID: 9270060
MOCVD System.
AIXTRON 2400G3 HT is an advanced-technology Close Coupled Showerhead (CCS) reactor sold by AIXTRON AG. It is designed to provide high throughput of thin-film deposition processes and facilitate excellent growth of single-crystalline films of III-V semiconductors. This PECVD reactor is suitable for materials science applications, such as crystalline silicon on insulator (SOI) and micro-electromechanical systems (MEMS). It has a modular configuration with several process chambers, such as a CCS chamber, two plasma chambers, one buffer chamber, and two process tubes. The CCS chamber, positioned at the center of the cluster tool, has a 6-pass multipole CCS where the process gas enters the center of the chamber and is then circulated towards the edge walls where it is atomized. This showerhead design enables uniform component distributions and excellent gas homogeneity, providing a high level of deposition rate reproducibility. At the end of the deposition process, the rapid temperature cycling equipment allows for a rapid cool down time to enable accurate layer control. In the two adjacent plasma chambers, the power is generated using either a Microwave (MW) or any of the other available plasma power sources. High temperature and pressure allow for the production of high-quality thin-films over large areas. The two process tubes, designed to be mounted on the two plasma chambers, are used for substrate loading and unloading, as well as gas distribution to each deposition chamber. AIXTRON 2400 G3-HT also offers a buffer chamber installed between the CCS and the two plasma chambers. This chamber serves as a buffer for the deposition process, helping to stabilize the system's conditions and prevents deposition rate fluctuations. Additionally, the buffer chamber can be used as an annealing/cooling chamber to further homogenize temperature and pressure. Furthermore, 2400 G3 HT is delivered with a state-of-the-art AIXTRON Process Control Software, Software S used for data-acquisition and monitoring of the deposition process. The graphical user interface of the unit allows users to set up all parameters in real-time, making the machine user-friendly and efficient.
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