Used AIXTRON 2600G3 HT #9233663 for sale

AIXTRON 2600G3 HT is an advanced, high-performance, closed-vessel chemical vapor deposition (CVD) reactor. This reactor is designed to provide reliable and high-quality thin-film deposition for a variety of materials. AIXTRON 2600 G3 HT is suitable for semiconductor and other thin film coating applications, such as deposition of metals, oxides, and nitrides. At the heart of 2600G3 HT is its robust deposition chamber, which is composed of a stainless steel wall and floor mounted on a rigid frame. This design allows for uniform heating and cooling of the chamber while being built to provide a reliable and long-life operation. The most remarkable feature of this equipment is its advanced temperature control system, which enables accurately controlled temperature profiling and process repeatability. This enables a remarkably stable deposition with minimized film surface defects. 2600 G3 HT is also equipped with an integrated two-step pyrometer, which provides real-time temperature measurements during the process. The 3900A unit provides enhanced safety and sustained machine life cycle, ensuring consistent and high-quality film deposition. Its fast load lock mechanism allows for continuous operations and enables quick turnaround time for wafers. This enhanced tool safety is also taken care of with an integrated TC warning asset, which monitors the temperature of the wafers and the jigs to ensure that the wafers are not exposed to unsafe conditions. In addition to its user-friendly and reliable operation, AIXTRON 2600G3 HT reactor also provides optimized thin-film distribution through an advanced showerhead technology. The showerhead design reduces variation between the layers on different wafers, thus ensuring the uniformity of the deposition process. The process stability is further improved through excellent gas and fluid flow delivery and mixing, forming a homogenous deposition of particles with uniform particle size uniformity and energy. Lastly, with high pulse current power supply, AIXTRON 2600 G3 HT can provide extra accurate thickness control with the highest resolution for ultra-thin coatings. Overall, 2600G3 HT is a highly innovative and reliable reactor designed to help customers create precise and high-quality metal, oxide, and nitride thin film coatings. Its advanced temperature control model, enhanced safety measures, and showerhead technology ensure repeatable and uniform coating results at the highest quality.