Used AIXTRON 2600 G3 #9270061 for sale

AIXTRON 2600 G3 is a high-end pulsed Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor for large area deposition of a variety of thin films. This reactor is specifically designed with advanced processing capabilities to meet the stringent requirements for semiconductor, solar, and display production. AIXTRON 2600G3 features a full range of automated options, including precision voltage control, RF potentiometry, and easy expandable process capability. The equipment allows for remote batch processing of up to 30 batches simultaneously. 2600 G3 also provides advanced multiple stage gas flow control, a quartz tube process chamber, an improved n-type gas flow system, and an integrated monitoring unit. 2600G3 offers a number of advantages for process and fla production. This reactor features a broad range of automated processing components, enabling uniform deposition over large areas, with excellent precision. It offers high plasma loading for increased thin film deposition rates. Additionally, the reactor offers sophisticated temperature control capabilities that enable optimal plasma formation and control. AIXTRON 2600 G3's rational gas flow machine maximizes gas flow for precise control of deposition. This reactor also offers a light weight and compact design perfect for laboratory use, as well as for industrial process applications. Moreover, AIXTRON 2600G3 has been specifically designed for operation in harsh industrial environments. In conclusion, 2600 G3 is a high-end, automated reactor for thin film deposition in semiconductor, solar, and display industries. This reactor is robust and offers multiple automated processing components. It features enhanced gas flow control, temperature control, and power control. 2600G3 also has a light weight and compact design to make it suitable for laboratory and industrial process applications, and is designed to operate in harsh environments.