Used AIXTRON AIX 2400 G3 HT #9293775 for sale

AIXTRON AIX 2400 G3 HT is a high-temperature (HT) cluster-tool reactive ion-beam evaporator (RIBE) equipment, designed for the fabrication of complex layers of advanced electronic materials. It is the latest addition to AIXTRON cluster-tool series and is capable of providing the most advanced architectural features necessary for the manufacture of high-performance, high temperature (HT) thin films and other micro-structured materials. AIXTRON AIX 2400 G3 / HT is composed of a deposition chamber, plasma generator assembly, and substrate processing area, all of which are enclosed within a large, shielded, and air-cooled stainless steel housing. This system is capable of producing advanced deposition recipes over the temperature range from 50-900 C, and deposition rates of up to 7nm/min. It also includes advanced multi-sensor process control units as well as real-time wafer-tracking capabilities. The deposition chamber is enclosed in a vacuum chamber and is fitted with high-temperature RF plasma generators, which are used to pre-treat and heat the substrates prior to deposition. The isothermal thin-film processing capabilities of AIX 2400 G3 HT allow for the production of complex and multi-layered structures. The chamber's computer-controlled data acquisition unit facilitates precise machine data handling, continuous process monitoring, and enables custom-tailored tool parameter adjustments to optimize the process flow. The plasma generator assembly is comprised of an inductively-coupled RF source, with the output power adjustable up to 700 Watts. Its gas feed ports are connected directly to the gas panels for the desired flows and pressures. The substrate processing area is outfitted with two wafers spacing stages, one for low-temperature processing and the other for high-temperature processing. A wafer clamping asset ensures accurate and repeatable deposition of high-temperature materials onto the substrates. The substrate processing area is also equipped with a laser sensor model for exacting endpoint accuracy and real-time substrate tracking. In summary, AIX 2400 G3 / HT is a robust and reliable cluster-tool reactive ion-beam evaporator equipment designed for the production of high-temperature thin films and other micro-structured materials. Its computer-controlled deposition chamber, plasma generator assembly, and substrate processing area provide an efficient and cost-effective solution for the manufacture of complex layers of advanced electronic materials.