Used AIXTRON AIX 2400 G3 HT #9352630 for sale

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Manufacturer
AIXTRON
Model
AIX 2400 G3 HT
ID: 9352630
Vintage: 2005
MOCVD System 2005 vintage.
AIXTRON AIX 2400 G3 HT is a high-throughput reactor equipment designed for industrial-scale semiconductor applications such as those found in the electronics and renewable energy industries. Its highly advanced design features high-temperature uniformity throughout the chamber and a modular design for easy maintenance. This metal-organic chemical vapor deposition (MOCVD) reactor system offers the following features: High-efficiency gas injection: AIXTRON AIX 2400 G3 / HT uses an advanced gas injection unit to quickly and precisely introduce reactive materials into the deposition chamber. This machine also allows for multiple substances to be used simultaneously for improved deposition efficiency. High-temperature efficiency: This reactor is designed to handle temperatures up to 1100°C, enabling faster and more uniform deposition of thin film materials such as single-walled carbon nanotubes, gallium nitride, and hafnium nitride. Optimal dopant management: AIX 2400 G3 HT offers uniform pressure and temperature profiles, which allow for precise dopant management. This tool also offers a range of dopant sources, leading to increased efficiency and higher yields. Robust accessories package: AIX 2400 G3 / HT comes with a range of components and consumables, such as exhaust components, shutters, crucibles, blades, chucks, and pumps. This makes it easy for customers to build an efficient deposition process tailored to their needs. Modular design for maintenance: AIXTRON AIX 2400 G3 HT adopts a modular design for easy maintenance and upgrades. This also enhances asset upgradability and helps to reduce downtime. This advanced industrial-grade reactor model from AIXTRON is the perfect solution for companies looking for a reliable and efficient way to deposit thin films and other materials on a large scale. It offers high uniformity, efficient gas injection, optimal dopant management, and a range of components and consumables. Hence, it is the ideal choice for semiconductor, renewable energy, and other industries that require high throughput deposition processes.
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