Used AIXTRON AIX 2800 G4 HT #9272506 for sale

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Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9272506
Vintage: 2008
MOCVD System In-situ tool ES-A25 Dry pump Size: 42"x2" (6-6) Manuals Gases: Gas / Source / Push NH3_1 / 30000 / 500 NH3_2 / 30000 / 500 SiH4_l / 100 / 500 SiH4_2 / - / - TMGa / 1000 / 500 TMAI / 500 / 500 Cp2Mg / 1000 / 500 TMIn / 1000 / 500 TEGa / 1000 / 500 2008 vintage.
AIXTRON AIX 2800 G4 HT is a high-temperature chemical vapor deposition (HT-CVD) reactor that facilitates the production of high-quality semiconductor materials. The capability to work under high-temperature conditions makes AIXTRON AIX 2800G4-HT ideal for a wide range of mission-critical studies and projects. AIX 2800G4 HT is an advanced equipment designed for deposition processes involving growth media of silicon, silicon nitride, dielectric, and carbon containing precursors. It offers the ability to precisely control thermodynamic parameters, making it suitable for both standard research tasks and specialized production requirements. AIXTRON AIX 2800 G 4 HT is equipped with an advanced auto-sampling system, which helps to reduce the time and effort needed to obtain results. This unit combines conventional and Digital Processing Control with an advanced CCD-based plasma source level (PSL) imaging machine. This powerful combination offers the user the best control possible in controlling key deposition parameters. AIX 2800G4-HT is a self-contained reactor that combines both modular and advanced automation equipment. It can be programmed to allow efficient and consistent deposition time on multiple wafers at once. Additionally, independent control is also available for each substrate table and Bernoulli endpoint. This feature is crucial in achieving a high level of product quality. AIX 2800 G 4 HT is touch screen controlled for maximum convenience. This feature makes navigating the tool and setting the parameters for each deposition a user-friendly experience. The large 10.1" LCD screen can display both process status and real-time graphs for improved visibility. Finally, AIX 2800 G4 HT comes with an advanced safety asset to prevent any accidents or environmental hazards. The reactor offers protection from both physical contact and dangerous excess temperatures. In addition, the self-closing chamber is designed to keep out any hazardous gases released during the deposition process. In conclusion, AIXTRON AIX 2800G4 HT is an impressive model designed to produce a wide range of high-quality semiconductor materials. It is easy to naviagate and equipped with numerous safety features, making it a reliable and efficient tool for research and production applications.
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