Used AIXTRON AIX 2800 G4 HT #9302603 for sale

AIXTRON AIX 2800 G4 HT series reactor from AIXTRON utilizes high-temperature processes to deposit thin-film materials such as III-V and group III-V compounds, metals and dielectrics. It combines very high deposition rates with high-quality deposition layers, extremely precise process control, low maintenance, as well as immunity to process-induced vibration. This makes AIXTRON AIX 2800G4-HT series reactors optimized for high-throughput processes in advanced semiconductor and optoelectronic device production. AIX 2800G4 HT series reactors features process automation, powerful process control capability, and high-speed EFEM control. The reactor also provides a unique combination of high power, very low process temperatures, large area deposition and unmatched spatial resolution. This makes it ideal for applications with requirements for high throughput with short cycle time or with strict requirements for uniformity and defect-free growth. AIXTRON AIX 2800 G 4 HT series features a 2.8 inch diameter crucible and susceptor with a 0.255-inch height. This allows the reactor to deposit layers with exactness and uniformity. The ECM control equipment also features a hot-wall furnace design that provides uniform furnace temperature with a high degree of accuracy and repeatability. The reactor also utilizes a unique, carefully designed dual-gas control system for high-quality deposition. The main features of the dual-gas control unit include high gas supply stability, fast gas activation, self-cleaning of excess gas, and ability to monitor/control process parameters in real-time. This cutting-edge reactor also offers improved performance and safety features. It comes with an innovative inert gas cascade machine that ensures process safety during operation and reduced downtime. It also comes with artificial intelligence-based data analysis and process monitoring capabilities that allow improved process control and optimization. AIX 2800 G4 HT series reactor is a perfect tool for growing advanced devices with high throughputs and parameters. It provides top-notch performance, along with automated and precise control, safety features, and large area deposition.