Used AIXTRON AIX 2800 G4 HT #9305773 for sale

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Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9305773
Vintage: 2008
MOCVD System Size: 42"x2" 2008 vintage.
AIXTRON AIX 2800 G4 HT is a metal-organic chemical vapor deposition (MOCVD) reactor designed for efficient and reliable heterostructure growth and deposition of advanced materials. This sophisticated deposition unit features a four-zone process chamber with a hot wall design. Its advanced temperature control loop ensures precisely repeatable deposition conditions for high quality heterostructures. AIXTRON AIX 2800G4-HT also offers a range of features to maximize the process window for high-purity deposition of the different types of materials used in the fabrication of LED's, lasers, solar cells and electronics. The first key feature of AIX 2800G4 HT is its four-zone process chamber. This arrangement allows for more efficient process control and reduces thermal gradients across the wafer, providing more uniform deposition performance. The process chamber is also equipped with a heated transfer arm, which allows for the quick transfer of substrates in and out of the reaction chamber without exposing the wafers to excessive process temperature. In addition, AIX 2800G4-HT has an advanced temperature control loop, which rapidly adapts to pressure changes and substrate orientation to stay within the desired target temperature range. AIX 2800 G 4 HT also provides an advanced set of deposition parameters to maximize the process window for different deposition applications. It is equipped with up to five hybridized showerheads that can be used for different deposition recipes. Its advanced and efficient gas conveyance equipment allows for uniform distribution of the precursors to the process chamber, while the advanced process monitoring system assists in keeping the process parameters in close accordance with the optimal growth recipes. AIXTRON AIX 2800 G 4 HT also offers an efficient substrate-handling mechanism. It features a compatible rotation unit that allows simultaneous, independent handling of up to three substrates, enabling a high throughput. The high-precision robot ensures accurate positioning of the wafers in the process chamber for long-term stable operation. Finally, its integrated process control software is user-friendly and provides a range of advanced automation features to reduce operator intervention. AIXTRON AIX 2800G4 HT is an advanced MOCVD reactor optimized to provide reliable and repeatable deposition performance for a variety of applications, including LED's, lasers, solar cells and integrated electronics. Its four-zone chamber offers precise control over the process parameters, while its advanced temperature control loop and automated handling machine ensure an efficient and reliable deposition operation.
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