Used AIXTRON AIX G5 HT #9283177 for sale

AIXTRON AIX G5 HT is a state-of-the-art continuous-flow, planetary-rotor High Throughput Reactor (HTR) for the production of microwave plasma-enhanced chemical vapor deposition (MPECVD) process. It is designed for high-rate deposition of materials with excellent latitude and selectivity. The reactor is capable of delivering high throughput rates (up to 20 wafers/min.) with constant temperature and gas control. AIXTRON AIX G 5 HT was designed to improve existing production operations thus providing the customers a high-precision, high-speed production line with reliable yields and cost efficiency. AIX G5 HT is a low pressure, vertically oriented, stainless steel reactor with a domed top and a water-cooled lid. The interior of the reaction chamber is equipped with a planetary rotating disc and two stationary gas inlet manifolds. The disc is used to rotate individual wafers during the deposition process. The gas inlets provide for an even distribution of the process gases across the entire wafer surfaces, allowing for uniformity and high-throughput capabilities. AIX G 5 HT is commonly implemented with RF or microwave power for plasma enhancement and etching operations. The RF power is generated by a tunable generator with a range of powers from 10 to 350 Watts. An advanced diagnostics system provides real-time monitoring and control of all process parameters such as power, reactant flows, temperatures and other critical gas-phase properties. AIXTRON AIX G5 HT presents numerous advantages compared to traditional batch reactors. It features a built-in automatic wafer monitoring system with the capability to detect wafer defects and defects in the substrate. It also has a built-in substrate heating system that allows for precise control of the substrate temperature during deposition. Additionally, AIXTRON AIX G 5 HT is equipped with a host of sensors and valves to ensure process control and uniformity. AIX G5 HT is suitable for a wide variety of chemical vapor deposition/etching applications including GaN, GaAs, InP, photovoltaic, and MEMS processes. With an easy to use graphical user interface, AIX G 5 HT can be easily incorporated into a production environment. The wide range of process parameters offered by AIXTRON AIX G5 HT ensure a cost-efficient, flexible, reliable and high throughput production systems.