Used AIXTRON Crius 31x2" #9199511 for sale

AIXTRON Crius 31x2 is an advanced MOCVD (Metal Organic Chemical Vapor Deposition) reactor that is particularly well-suited to the production of optoelectronic devices such as LEDs and lasers. It is an AIXTRON Massively Parallel Processing equipment, which allows for both single wafer and batch processing operations, with a configuration for both 300 and 600 mm wafers. The Crius 31x2 system offers an impressive range of capabilities, including a powerful electron-cyclotron-resonance (ECR) plasma formation, along with a unique configuration for deposition uniformity and epitaxial quality control. Its large process chambers are designed to allow for up to three gas inlets and an additional remote one, for gas mixtures or individual gases, to maintain a clean and uniform environment inside the chamber. The large-area chamber also allows for a larger volume of gas and a better gas flow. The Crius 31x2 offers two distinct features for optimizing epitaxial deposition quality: MESA (Macroscopic Edge-Spreading Analysis) and SEMPA (Spatially Extended Molecular Plating Analysis). The MESA unit provides a real-time in-situ analysis to determine the deposition non-uniformity at the wafer edge (the "macroscopic" area), while SEMPA, on the other hand, offers a method to check the non-uniformity on a small-scale, spatial scale. Together, the two systems help to ensure that the epitaxial deposition is perfectly uniform and of the highest quality. In addition to the enhanced deposition quality, the Crius 31x2 also offers other features, such as optimized substrate temperature control with a temperature uniformity of +/- 5° C over a full wafer and a peak temperature of up to 900 °C. It also comes with remote direct-access control, ensuring robust and reliable operation from any location. Overall, AIXTRON Crius 31x2 is an advanced MOCVD machine that is perfect for producing high-quality optoelectronic devices. Its impressive range of features and capabilities make it highly reliable for both single wafer and batch processing operations, as well as a variety of other applications.