Used AIXTRON Crius 31x2" #9353178 for sale

AIXTRON Crius 31x2 is a metal-organic chemical vapor deposition (MOCVD) reactor. It is a widely utilized tool for industrial production of high-quality optoelectronic materials, such as light-emitting diodes (LEDs) and laser structures. The Crius 31x2 is capable of depositing up to two different III-V material structures simultaneously, allowing for single wafer processing of complex multi-layer heterostructures. The reactor has several distinct components, including the loadlock chamber, diffusion chamber, and reaction chamber. The loadlock chamber is used to transfer substrates, such as GaAs substrates, into the diffusion chamber. The diffusion chamber is a vessel used to gradually preheat substrates prior to transferring them into the reaction chamber. The reaction chamber is the primary working environment for the reactors. It is a quartz reaction tube fitted with a two-zone temperature control, which can be adjusted for up to two different material processes. The Crius 31x2 is equipped with in-situ metrology capabilities, which entails the capability to measure film thickness, dust particles, and other pertinent parameters in a non-destructive fashion. This allows for the customization of processes for specific material properties, or to ensure time-efficient mass production. In addition, the "31x2" nomenclature of the Crius refers to the number of Independent Reacting Space (IRS) it has: with two IRS, the Crius can deposit two separate reactions simultaneously. The Crius 31x2 also affords its users with reliable reproducible results. It offers highly optimized, automated recipes for rapid growth of target materials, controlled layer by layer. The Crius 31x2's process chamber is equipped with a dedicated gas supply manifold and RF generator, allowing for the increased flexibility of gas flow and process conditions. The reactor also offers excellent temperature uniformity, with a temperature range of -60°C to 700°C. Overall, AIXTRON Crius 31x2 is an excellent, reliable MOCVD reactor for use in the industrial production of optical semiconductor and laser components. It offers unparalleled speed and precision for multi-layer heterostructure deposition, as well as robust automated process control for reproducible and reliable results.