Used AIXTRON Crius II #9270073 for sale

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Manufacturer
AIXTRON
Model
Crius II
ID: 9270073
Vintage: 2011
MOCVD System GaN 2011 vintage.
AIXTRON Crius II is a state-of-the-art Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor, combining advanced process technology with superior quality, cost-effectiveness and multiuser operation. The equipment features an easy to use GUI, allowing experienced users to configure the reactor parameters for optimal performance. With its flexible process chamber design, a wide range of thin film materials can be deposited in a short deposition time. Crius II is a multi-chamber system with two process chambers: the Reaction Chamber and the Substrate Chamber. The Reaction Chamber is equipped with an inductively coupled 13.56MHz source for generating rf plasma. AIXTRON Crius II is equipped with an independent RF power source allowing precise power control with low ripple and high level of repeatability, suitable for a wide range of deposition processes. Crius II is capable of generating high power and high pressure plasmas of a number of gases, allowing the user to tailor the process to the desired result. The Substrate Chamber is outfitted with a substrate heater, temperature controlled by an external circulation unit for carrier, nitrogen and argon. The machine is designed for operation over a wide range of temperatures and is capable of uniform heating up to 850°C. AIXTRON Crius II also features an active cooling tool to ensure optimal deposition process conditions. Crius II includes a process control module, with user-friendly software for the configuration and optimization of the deposition process. A range of process parameters can be adjusted according to user specifications, such as power level, process gas composition and process time. AIXTRON Crius II is modular in construction, allowing changes to the asset hardware as needed for a variety of deposition applications. Crius II is a versatile reactor, offering users the capability to exploit the advantages of PECVD processes. With its long life span, cost effectiveness and high quality deposition results, AIXTRON Crius II is a great tool for research and development on a variety of different thin film projects.
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