Used AIXTRON Crius II #9272514 for sale

AIXTRON Crius II is an advanced deposition equipment designed to offer efficient and precise physical vapor deposition (PVD) processes for a wide range of applications. The reactor utilizes a 'suspended substrate' technique that allows users to change and improve their film deposition capabilities. This technique suspends the substrate material on heated pedestals, allowing for a uniform deposition across the entire substrate without clumping or build up in certain areas. Crius II is capable of producing batches of substrates with a large range of sizes and shapes. AIXTRON Crius II is equipped with an automated substrate handling system that allows users to adjust the motion of the substrates and optimize the alignment of the substrate relative to the deposition source. This enables users to make precise and controllable thickness variations across the substrate surface. Additionally, Crius II features an innovative deposition source which utilizes a unique anodic arc-discharge process to provide highly precise deposition rates and make precise film thicknesses. The interior of AIXTRON Crius II features an advanced air-cooling unit that ensures efficient heat management, keeping the deposition process at consistent temperatures across the entire chamber. Additionally, the chamber features a nitrogen gas-flow fuel injection machine to create a high-purity atmosphere for quality deposition processes. Crius II also features an advanced diagnostics tool utilizing an embedded PC to monitor, acquire and analyze data from the reactor environment. This helps users reduce maintenance costs as well as improve the quality of substrate deposition and coating. AIXTRON Crius II is able to monitor environmental parameters including pressure, temperature, and humidity, which helps ensure repeatable and consistent deposition results. Crius II is an efficient and reliable deposition asset suitable for a wide range of applications. It provides users with precise deposition rates and uniform substrate coating capabilities, as well as a highly reliable environment with excellent heat management and data acquisition systems. As a result, AIXTRON Crius II is an ideal reactor for high-precision deposition processes used in a variety of industries.