Used AIXTRON Crius II #9272520 for sale

AIXTRON Crius II is a dual-source, state-of-the-art MOCVD reactor designed for high-volume silicon and compound semiconductor production. It boasts a compact footprint and a user-friendly work surface. Featuring a number of innovative features, Crius II delivers process-enhancing benefits with has fast wafer transfer, a high throughput rate, and manual and automatic control options. AIXTRON Crius II has been specifically designed for the production of silicon substrates/wafers, high-efficiency solar cell production, LED fabrication, MEMS/MOEMS, 3D IC and HC GRIN lenses. Crius II offers precision coater and metrology systems to enhance process repeatability. The advanced independent dual-source equipment allows for precisely optimized growth conditions for each individual application, which supports increased yields and shorter cycle times. Each source, such as the gas source, can create its own specific set of conditions, providing the flexibility for maximum system performance optimization. AIXTRON Crius II also features a high-efficiency, configurable Multi-Reactor design that enables multi-layer deposition for complex structures. The advanced optical interferometers provide bidirectional support for process tuning. The unit has a real-time wavelength and intensity control that enables process optimization in a dynamic manner. Additionally, Crius II provides dedicated reflectometry solutions for optical filter measurement and provides continuous optical monitoring of the deposition process. AIXTRON Crius II is equipped with an extensive set of safety features. Its climate-control design features a closed-loop, compressed-air cooling machine for enhanced process performance. Additionally, Crius II features advanced remote access debugging capabilities to enable support from AIXTRON global service team. Overall, AIXTRON Crius II is a reliable and robust, all-in-one MOCVD reactor that provides manufacturers with the advantages of high performance, scalability, and user flexibility. With its high-throughput rate, precision processes, safety features, and advanced optical monitoring, Crius II is the perfect choice for manufacturing high-volume compound semiconductor substrates.