Used AIXTRON Crius II #9272526 for sale

AIXTRON Crius II is a state-of-the-art production scale reactor designed for the deposition of thin films and coatings. It features a special design construction to allow for an even and well-defined deposition of thin film and coatings over large areas, from around 2x2 cm to the size of a full chamber. Crius II can be used in both batch and production processes, and is suitable for a variety of applications, such as microelectronics, optical coatings, and materials research. AIXTRON Crius II is a high power, high capacity reactor equipped with a 2800-watt microwave generator, temperature regulation system, automated process control, and Ethernet communication interface. It uses two coils to generate a microwave field, each with a power of 1400 W. This process improves the ability for deposition of thin films with a high conformity and uniformity. The reactor also features an on-board computer with a 10-inch touchscreen display. This display is used to monitor events during the deposition process and to access a variety of process variables such as temperature, time and pressure. This all-in-one touch control system enables process adjustments on the fly, direct from the operator's station. The maximum transmitted power of Crius II is 2800 watts but its power can be adjusted to suit the requirements of specific thin film deposition projects. This level of flexibility makes it ideal for thin film deposition on a wide range of substrates such as silicon, glass, and metals. AIXTRON Crius II is a highly efficient reactor that enables the user to achieve deposition rates up to 2.5 to 3 times greater than other production scale reactors. It also boasts improved deposition uniformity due to its advanced single-lamp source configuration, allowing uniform distribution of the heat generated over the entire chamber. This also makes Crius II ideal for rapid deposition processes, such as ones involving short cycle times. AIXTRON Crius II reactor offers a wide range of features and is suitable for a variety of applications and deposition processes. With its advanced features and efficient design, Crius II supports a faster and easier coating production process, making it an ideal choice for development laboratories.