Used AIXTRON Crius #9184895 for sale

AIXTRON Crius is a chemical vapor deposition (CVD) reactor that can be used for various semiconductor processes. Crius is designed to provide high uniformity of deposition rates over large areas at lower temperatures and pressures than other classical CVD reactors can achieve. This reactor also offers the lowest operating costs on the market. The reactor utilizes a dual shower head arrangement, which adds to the uniformity of the deposition process. This configuration forces gas flow to penetrate evenly to both sides of the chamber, and avoids variations in the amount of material deposited within the chamber. The use of a rotating circular shower head significantly enhances the smoothness of the deposition process at the edges of the chamber. AIXTRON Crius reactor can reach the temperatures required by various semiconductor processes, with a maximum of 1,500 °C. Crius is equipped with three RF capacitors, configured for in-situ plasma generation, allowing for higher reactor performance, as well as the possibility to process higher material densities. The reactor can operate at a pressure range of 5 mBar to 6.7 bar, depending on the process parameters. AIXTRON Crius also offers a wide range of gas configurations, allowing for a variety of applications. The enhanced process control options include automatic chamber purging, automatic gas switching, and real-time process monitoring. Crius is also compatible with the AXR SDK software suite, which facilitates the integration of the reactor into a larger environment. This software includes advanced foreign object detection capabilities, as well as end-to-end data acquisition features, which incorporate productivity monitoring, part-dependent nesting, and advanced route calculation. AIXTRON Crius, with its low operating costs, as well as enhanced process control and powerful software suite, is an ideal choice for semiconductor and solar cell processing.