Used AIXTRON Crius #9184896 for sale

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AIXTRON Crius
Sold
Manufacturer
AIXTRON
Model
Crius
ID: 9184896
Wafer Size: 4"
Vintage: 2008
MOCVD Epi reactor, 4" 2008 vintage.
AIXTRON Crius is a high temperature chemical vapor deposition (HTCVD) reactor developed and manufactured by AIXTRON. Crius reactor is designed for the production of large-area thin films and nanostructured devices using a variety of high quality deposition processes. The reactor is equipped with a fully transmissive top-hat type quartz chamber, allowing for easy access to the substrate or sample. AIXTRON Crius is ideal for research and development applications such as organic light-emitting diodes (OLEDs) and thin-film solar cells. Crius is a reliable and efficient reactor that operates at temperatures of up to 400°C. It is equipped with an AIXTRON patented multi-point ignition system that enables quick start-up and a simplied cleaning and maintenance process. The reactor is also designed to work with AIXTRON advanced process control software, which allows for rapid and accurate process parameters tuning. AIXTRON Crius features a fully automated loading and unloading system making it possible to move substrates in and out of the chamber in a matter of minutes. The integrated RF power generator makes it easy to deliver high levels of power to achieve uniform and efficient results. Crius reactor is enhanced with a distillation chamber and a susceptometer rack, enabling a rapid analysis of chemical and physical properties of different materials. Additionally, AIXTRON Crius reactor is compatible with AIXTRON advanced gas delivery systems, allowing for easy and safe handling of the reactive gases. Crius boasts high-speed production rates up to 400 wafers per hour, making it the ideal solution for mass-production operations. The reactor is easy to integrate into existing production line, with minimal setup and maintenance requirements. The reactor is designed to meet a wide range of process requirements, and can be used for deposition processes based on silane, siloxane and halogen chemistry. In addition, AIXTRON Crius is equipped with a number of safety features, including gas detectors, fire detectors, over-pressure protection, and insulated process gas supply lines. To sum up, Crius is a highly versatile HTCVD reactor that delivers accurate and repeatable results. Equipped with automated loading and unloading systems, safety features, and process control software, it is the ideal choice for large-scale, industrial production of high quality thin films and nanostructured devices.
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