Used AIXTRON VP 2400HW #9222203 for sale

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AIXTRON VP 2400HW
Sold
Manufacturer
AIXTRON
Model
VP 2400HW
ID: 9222203
MOCVD System.
AIXTRON VP 2400HW is a high-end epitaxial reactor for metal-organic chemical vapor deposition (MOCVD). This reactor is designed to meet the highest requirements in manufacturing processes, with the ability to deposit metal oxide, silicon, and nitride layers. AIXTRON VP 2400 HW is equipped with a high-Delta pressure process chamber and is equipped with a High End MOCVD Source Unit offering purer gases, as well as improved production yields. This source is integrated within the higher pressure process chamber, which provides improved homogeneity of material deposition. VP 2400HW is also equipped with a high-end automatic susceptor loading and unloading equipment. This system is capable of handling up to 4 wafers at the same time and provides fine-tuning of the reactant introduction. This unit also allows for the loading and unloading of wafers without any manual intervention or expensive external robots. VP 2400 HW is equipped with a flexible wafer positioning machine. This tool allows for exact positioning of the reactants above the wafers, and also features a multi-zone heating option, which can uniformly heat the sample up to a maximum of 1400°C. The advanced 3-Zone Chimney Design of AIXTRON VP 2400HW allows for a continuous heat-up and cooling of the entire process chamber. This design also enables the production of highly uniform layers with improved accuracy. AIXTRON VP 2400 HW is also equipped with a process monitoring and control asset, which allows for the further optimization of process parameters. The process chamber and source unit can be easily separated and replaced due to the innovative design of VP 2400HW. This design also ensures improved safety by avoiding any potential contamination between the chamber and the source. VP 2400 HW is an advanced MOCVD deposition model, offering improved production yields, uniform coating, and process optimization capabilities. It is the ideal choice for manufacturers that require improved production yields and the highest levels of quality in the production of metal oxides, silicon, and nitride layers.
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