Used AMAT / APPLIED MATERIALS 0090-09920 #293655134 for sale

AMAT / APPLIED MATERIALS 0090-09920 reactor is a fully-deposited (FD) Low Pressure Chemical Vapor Deposition (LPCVD) equipment used for semiconductor processing. AMAT 0090-09920 is an advanced system unit capable of processing a wide range of materials, including silicon oxides, nitrides, and carbides. The machine also supports innovative processes such as Multi-Layer deposition and Atomic Layer Deposition (ALD). APPLIED MATERIALS 0090-09920 reactor is designed to be highly reliable and low maintenance, allowing users to achieve excellent process control and repeatability. It is constructed with a thick wall stainless steel chamber, allowing for efficient thermal exchange between the substrate and the process gases. The interior chamber consists of a top, middle and bottom heating section, with the bottom section working in tandem with the type M-1.3 Asher to achieve desired deposition rate and thickness. 0090-09920 is equipped with an automated gas distribution table, which ensures the accurate control of gas flows and mixtures. It also features an advanced chemical control tool which allows users to electronically control temperatures and chemical reactants for accurate and reproducible processing. The asset also provides real-time access to data, process parameters and recipes for easy process evaluation. In addition, AMAT / APPLIED MATERIALS 0090-09920 has a built-in pressure monitoring subsystem and provides an overpressure protection model for protection of substrates and safety of personnel. Overall, AMAT 0090-09920 is a powerful, compact and efficient reactor, capable of producing high-quality semiconductor devices at high yield and precision. Its advanced process control and safety features make it a safe and reliable choice for processing various materials. The performance and innovation of APPLIED MATERIALS 0090-09920 make it an ideal choice for modern semiconductor manufacturing.