Used AMAT / APPLIED MATERIALS 0242-29971 #293656311 for sale

AMAT / APPLIED MATERIALS 0242-29971 Reactor is a high-performance tool used in the fabrication of a variety of semiconductor materials. This single-wafer ion implantation reactor offers superior uniformity, dose accuracy, and yield. The reactor has a maximum ionized beam current of 2.50 A and employs twelve independent ion sources in a multi-ring design. It operates at a maximum pressure of 10-4 Torr, and has a turbo speed range of 0 to 4,500 RPM, and a temperature range of 100-500°C. Additionally, it features two high-precision alignment stages and an adjustable energy scan range of 1-20 MeV. AMAT 0242-29971 reactor is designed with advanced chamber components and features to ensure efficient processing. The substrate holder assembly is composed of stainless steel poles that provide secure positioning of the substrates. The gas and fluid distribution panels prevent any doping with other gases. The top and bottom gas introduction components feature an optimized supply system that ensures proper delivery of gas, helping to optimize dosing times and ensure uniform results. APPLIED MATERIALS 0242-29971 reactor also has a 10 kW RF power source with various tuning configurations. It has isolated tuning pads for fast and yielding deposition of thin films, excellent results for both conductive and dielectric materials. Additionally, the reactor includes multiple sensors to measure and monitor chamber pressure, temperature, gas flow, and the ion source current. The advantages of 0242-29971 Reactor include reliable and uniform processing results, excellent performance, fast cycle times, and minimal substrate damage. This makes it an ideal tool for a variety of demanding semiconductor fabrication processes.