Used AMAT / APPLIED MATERIALS AMS 2100 #9068943 for sale

AMAT / APPLIED MATERIALS AMS 2100 Reactor equipment is designed for use in semiconductor manufacturing processes and provides advanced deposition capabilities for metal, dielectric, and III-V semiconductor materials. It is composed of three main components: the Process Chamber, the Gas Delivery System (GDS), and the Controller. Process Chamber: The Process Chamber is designed to create the necessary pressure, temperature, and gas conditions for the fabrication of semiconductor substrates and wafers. It features a novel septumless design that eliminates the need for covers and allows direct delivery of process gases into the center of the chamber. The chamber has also been designed with the flexibility to accommodate a wide range of process requirements, including unit integration with multiple source technologies (CVD, PECVD, PVD, etc.). The chamber is made of an innovative stainless steel and Teflon construction which provides efficient thermal transfer and thermal management of the substrate. Gas Delivery Machine: The GDS controls the flow of process gases and is equipped with advanced control features. This includes independent control of gas flow, total flow level, and pressure. The GDS is also designed to be integrated with other sources and compatible with a variety of process tools. Controller: The Controller is designed to provide a unified view of the entire AMAT AMS 2100 tool. It is equipped with advanced graphical user interface (GUI) features that provide easy setup and control of the asset. The user can quickly access all parameters and diagnostic information from the Controller's control panel. The software also allows remote access and data management from a computer or tablet. Overall, APPLIED MATERIALS AMS 2100 Reactor is designed to meet the highest levels of performance and reliability during large-scale semiconductor manufacturing processes. It features a unique and integrated approach to model design that allows for superior control of process gases and efficient thermal management. The controller provides an intuitive user interface for easy setup and control. This makes AMS 2100 Reactor an excellent choice for any semiconductor fabrication facility.