Used AMAT / APPLIED MATERIALS Centura DLH #9093318 for sale

AMAT / APPLIED MATERIALS Centura DLH is a PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor that is used in the industry for thin film deposition. This reactor is versatile and utilizes Inductively Coupled Plasma (ICP) sources to enable high-rate deposition of a variety of materials in production environment. The PECVD process is used in many advanced semiconductor and microelectronic applications, such as deposition of films for photovoltaic applications, dielectric applications, metallization, sensitized layers, protective coatings and patterned polymers. The PECVD process utilizes a mix of gases to deposit thin films with equipment such as AMAT Centura DLH. The reactor is comprised of an RF generator which generates the power to the plasma source. The plasma source within the reactor is used to produce the ionization process to help the gas molecules break up and react. This process then produces the deposited layer on the substrate. The power sources used in the system are RF (Radio Frequency) and DC (Direct Current). The RF frequency and power for plasma generation is typically 13.56MHZ and 250W. The plasma power created is variable and can be adjusted according to the desired deposition of materials. For rapid deposition of films, higher powers can be used but must be handled in a controlled manner to prevent any damage to the chamber. APPLIED MATERIALS Centura DLH reactor also has a Gas Mass Flow Controllers (GFMCs) installed that allow for accurate control over the levels of gases used. These gas shall within the system can be adjusted to achieve the desired material deposition rate. Centura DLH also has a heating zone within the RF generator that can allow for temperatures of up to 400°C to be achieved. This temperature can be used in order to control the reaction rate and deposition thickness of the films being produced. The overall design of AMAT / APPLIED MATERIALS Centura DLH is highly reliable and produces uniform results over multiple passes. The chamber is designed with a low power consumption, operation costs and maintenance requirements and is efficient when it comes to producing dielectric and thick films. AMAT Centura DLH is also a fully automated real time monitoring device, which allows for monitoring the process parameters and making necessary adjustments for optimal performance. In conclusion, APPLIED MATERIALS Centura DLH is a reliable and versatile PECVD reactor that allows for the production of dielectric and thick films in production level environment. The reactor utilizes an RF power source to generate the plasma and also has regulator GCMs to control the levels of gases used. With its low power consumption and operation costs, the reactor is a cost-effective and efficient tool for the microelectronic industry. Centura DLH also has automatic real time monitoring, allowing for optimal performance and reliable results.