Used AMAT / APPLIED MATERIALS Centura DLH #9093319 for sale

AMAT / APPLIED MATERIALS Centura DLH is a reactor intended for wafer processing in a semiconductor fabrication facility. This reactor has a process chamber with a capacity of approximately 200 mm in diameter and 200 mm in height, and uses helium to cool and provide a low ambient pressure within the chamber. The reactor also provides ultra-high vacuum operation and can operate between base pressures down to 10-7 Torr. AMAT Centura DLH is designed to provide engineers and technicians with a wide range of options and capabilities for the processing of silicon wafers. This includes high throughput capabilities, precise control of temperature, gas delivery and pressure with the capability of operation in a wide range of process conditions. The reactor allows for wafer processing in temperatures up to 1200°C and can be used for metal deposition, dielectric deposition, annealing and etching. For metal deposition, the reactor is capable of depositing aluminum, copper and titanium with excellent uniformity. In addition, the reactor provides excellent uniformity for dielectric deposition such as oxides and nitrides as well as resist and polysilicon. APPLIED MATERIALS Centura DLH reactor utilizes a cooled baffle and directional nozzle to provide a uniform flow in the process chamber. This ensures a uniform deposition rate across the wafer surface and also helps to eliminate particles and other contaminants from the chamber. The reactor also includes a range of advanced features and capabilities such as uniformity control, wafer temperature control, process optimization and real-time control. These features allow users to optimize their processes for higher throughput and improved yield. In addition, Centura DLH reactor is designed for rapid reactivation and clean up of the process chamber during maintenance and downtime. This reduces downtime and increases productivity for your silicon wafer processing. Overall, AMAT / APPLIED MATERIALS Centura DLH is a reliable and efficient reactor for various processes related to silicon wafer fabrication. With a wide range of advanced features and capabilities, this reactor is designed to provide users with the flexibility and performance needed to achieve high quality results.